Growth of black arsenic phosphorus thin films and its application for field-effect transistors

Nezhueyotl Izquierdo, Jason C Myers, Prafful Golani, Adonica De Los Santos, Nick Seaton, Steven J. Koester, Stephen A. Campbell

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

Black arsenic phosphorus single crystals were grown using a short-way transport technique resulting in crystals up to 12 x 110 μm and ranging from 200 nm to 2 μm thick. The reaction conditions require tin, tin(IV) iodide, grey arsenic, and red phosphorus placed in an evacuated quartz ampule and ramped up to a maximum temperature of 630 °C. The crystal structure and elemental composition were characterized using Raman spectroscopy, x-ray diffraction, and x-ray photoelectron spectroscopy, cross-sectional transmission microscopy and electron backscatter diffraction. The data provides valuable insight into the growth mechanism. A previously developed b-P thin film growth technique can be adapted to b-AsP film growth with slight modifications to the reaction duration and reactant mass ratios. Devices fabricated from exfoliated bulk-b-AsP grown in the same reaction condition as the thin film growth process are characterized, showing an on-off current ratio of 102, a threshold voltage of -60 V, and a peak field-effect hole mobility of 23 cm2/V·s at Vd=-0.9 V and Vg=-60 V.

Original languageEnglish (US)
Article number325601
JournalNanotechnology
Volume32
Issue number32
Early online dateApr 27 2021
DOIs
StatePublished - Aug 6 2021

Bibliographical note

Funding Information:
Portions of this work were conducted in the Minnesota Nano Center, which is supported by the National Science Foundation (NSF) through the National Nano Coordinated Infrastructure Network, under Award ECCS-2025124. N.I. also received support from this award. P.G. and S.J.K. acknowledge support by the NSF under Award ECCS-1708769. Parts of this work were supported by the Partnership for Research and Education in Materials (PREM) Program of the National Science Foundation under Award Number DMR-1523577. Parts of this work were carried out in the Characterization Facility, University of Minnesota, which receives partial support from NSF through the MRSEC program, under Award DMR-1420013.

Publisher Copyright:
© 2021 IOP Publishing Ltd.

Keywords

  • black arsenic phosphorus
  • crystal growth
  • thin film

MRSEC Support

  • Partial
  • Shared

PubMed: MeSH publication types

  • Journal Article

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