Keyphrases
Growth Rate
100%
Rutile
100%
Growth Form
100%
Organic Molecular Beam Deposition
100%
R-plane Sapphire
100%
Metal-organic Materials
100%
Oxygen Plasma
50%
Atomic Force Microscopy
25%
Epitaxial
25%
Transmission Electron Microscopy
25%
Film Thickness
25%
Substrate Temperature
25%
RF Plasma
25%
Phase-pure
25%
Reaction Limit
25%
Reflection High-energy Electron Diffraction
25%
Reflectivity
25%
Layer-by-layer Growth
25%
Film Growth
25%
Rutile TiO2
25%
Sapphire Substrate
25%
Plasma Sources
25%
TiO2 Film
25%
Flow Mode
25%
Force Transmission
25%
Flux Limit
25%
Step Flow
25%
Material Science
Molecular Beam Epitaxy
100%
Film
100%
Sapphire
100%
Titanium Dioxide
100%
Titanium
50%
Reflectivity
50%
Film Thickness
50%
Transmission Electron Microscopy
50%
Film Growth
50%
Reflection High-Energy Electron Diffraction
50%
Engineering
Growth Mode
100%
Atomic Force Microscopy
33%
Sapphire Substrate
33%
Initial Stage
33%
Substrate Temperature
33%
Energy Electron Diffraction
33%
Step Flow
33%
Rf Plasma Source
33%
Reflectance
33%