Generation of nano-sized free standing single crystal silicon particles

Y. Dong, A. Bapat, S. Hilchie, U. Kortshagen, S. A. Campbell

Research output: Contribution to journalArticlepeer-review

15 Scopus citations


The generation of nano-sized monodispersed single crystal silicon particles was examined by designing a system. It was found that the silicon particles were generated using a SiH 4/H 2 mixture in a high density plasma. The charged particles were injected into a high temperature annealing tube to be heated. It was concluded that single crystal particles were observed at low temperature anneals (300 °C).

Original languageEnglish (US)
Pages (from-to)1923-1930
Number of pages8
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number4
StatePublished - Jul 2004


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