Ge implantation to improve crystallinity and productivity for solid phase epitaxy prepared by atomic mass unit cross contamination-free technique

Kong Soo Lee, Dae Han Yoo, Jae Jong Han, Gil Hwan Son, Chang Hun Lee, Ju Hee Noh, Seok Jae Kim, Yong Kwon Kim, Young Sub You, Yong Woo Hyung, Hyeon Deok Lee

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