Gate Stack and Silicide Issues in Silicon Processing: Preface

Research output: Contribution to journal › Conference article › peer-review

Original language	English (US)
Pages (from-to)	xi
Journal	Materials Research Society Symposium - Proceedings
Volume	611
State	Published - 2001
Event	Gate Stack and Silicide Issues in Silicon Processing - San Francisco, CA, United States Duration: Apr 25 2000 → Apr 27 2000

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@article{b1c5dd0ef3674d27bdfc6b683daa2a68,

title = "Gate Stack and Silicide Issues in Silicon Processing: Preface",

author = "Clevenger, \{L. A.\} and Campbell, \{S. A.\} and Besser, \{P. R.\} and Herner, \{S. B.\} and J. Kittl",

year = "2001",

language = "English (US)",

volume = "611",

pages = "xi",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "Gate Stack and Silicide Issues in Silicon Processing ; Conference date: 25-04-2000 Through 27-04-2000",

}

TY - JOUR

T1 - Gate Stack and Silicide Issues in Silicon Processing

T2 - Gate Stack and Silicide Issues in Silicon Processing

AU - Clevenger, L. A.

AU - Campbell, S. A.

AU - Besser, P. R.

AU - Herner, S. B.

AU - Kittl, J.

PY - 2001

Y1 - 2001

UR - https://www.scopus.com/pages/publications/0035026278

UR - https://www.scopus.com/pages/publications/0035026278#tab=citedBy

M3 - Conference article

AN - SCOPUS:0035026278

SN - 0272-9172

VL - 611

SP - xi

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

Y2 - 25 April 2000 through 27 April 2000

ER -