Gallium self-diffusion in gallium phosphide

Lei Wang, J. A. Wolk, L. Hsu, E. E. Haller, J. W. Erickson, M. Cardona, T. Ruf, J. P. Silveira, F. Briones

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Ga self-diffusion in gallium phosphide (GaP) is measured directly in isotopically controlled GaP heterostructures. Secondary ion mass spectroscopy (SIMS) is used to monitor intermixing of 69Ga and 71Ga between isotopically pure GaP epilayers which are grown by molecular beam epitaxy (MBE) on GaP substrates. The Ga self-diffusion coefficient in undoped GaP is determined to be D = 2.0 cm2s-1 exp(-4.5 eV/kBT) between 1000 and 1190 °C under phosphorus-rich condition. The self-diffusion entropy is found to be ∼4 kB.

Original languageEnglish (US)
Pages (from-to)1831-1833
Number of pages3
JournalApplied Physics Letters
Issue number14
StatePublished - Apr 7 1997


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