GaAs-substrate-based long-wave active materials with type-II band alignments

  • S. R. Johnson
  • , S. Chaparro
  • , J. Wang
  • , N. Samal
  • , Y. Cao
  • , Z. B. Chen
  • , C. Navarro
  • , J. Xu
  • , S. Q. Yu
  • , David J. Smith
  • , C. Z. Guo
  • , P. Dowd
  • , W. Braun
  • , Y. H. Zhang

Research output: Contribution to journalConference articlepeer-review

Abstract

Evidence of the type-II alignment at the heterointerface between GaAsSb and InGaAs was obtained with the optimal layer configuration being the asymmetric GaAsSb/InGaAs bilayer. The suitability of GaAs/GaAsSb/GaAs and the strain-compensated GaAsP/GaAs/GaAsSb/GaAs/GaAsP coupled-quantum-well system for long-wave applications was shown. Inhomogeneous linewidth broadening due to lateral composition and thickness modulation was dramatically reduced by the addition of GaAsP strain-compensation layers to GaAsSb-based trilayer quantum-well systems.

Original languageEnglish (US)
Pages (from-to)1501-1504
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume19
Issue number4
DOIs
StatePublished - Jul 2001
Externally publishedYes
Event19th North American Conference on Molecular Beam Epitaxy (NAMBE-19) - Tempe, AZ, United States
Duration: Oct 15 2000Oct 18 2000

Fingerprint

Dive into the research topics of 'GaAs-substrate-based long-wave active materials with type-II band alignments'. Together they form a unique fingerprint.

Cite this