Functional materials integrated on III-V semiconductors

Javad Gatabi, Kevin Lyon, Shafiqur Rahman, Manuel Caro, Juan Rojas-Ramirez, Joelson Cott-Garcia, Ravi Droopad, Byounghak Lee

Research output: Contribution to journalArticlepeer-review

11 Scopus citations


The integration of ferroelectric oxides on semiconductors has been achieved through the use of molecular beam epitaxy and solution spin coating. The oxide layers were determined to be single phase and crystalline and were oriented with the (1 0 0) along the growth direction. Epitaxial SrTiO3 and BaTiO3 buffer layers were grown on GaAs and Si using a unique MBE process for nucleation that suppressed the formation of interfacial oxide. The deposition of ferroelectric Pb(Zr)TiO3, on STO buffered Si and GaAs was carried out using solution spin coating. The nucleation of the oxide growth by solution spin coating was promoted by the crystallinity of the surface structure of the SrTiO3 buffer layer. Ab initio Density Functional Theory calculations were used to determine the interfacial structure and band alignments for the STO/GaAs and BTO/GaAs interfaces. Initial electrical characterization of the PZT grown on GaAs was determined by measuring the polarization versus electric field which suggests evidence of ferroelectricity.

Original languageEnglish (US)
Pages (from-to)117-121
Number of pages5
JournalMicroelectronic Engineering
StatePublished - Nov 1 2015

Bibliographical note

Funding Information:
This work is supported by the AFOSR under Grant # FA9550-10-1-0133 .

Publisher Copyright:
© 2015 Elsevier B.V. All rights reserved.


  • Barium titanate
  • Density Functional Theory
  • Ferroelectric oxides
  • Lead zirconium titanate
  • Molecular beam epitaxy
  • Solution spin coating


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