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Formation and removal of composite halogenated silicon oxide and fluorocarbon films deposited on chamber walls during plasma etching of multiple film stacks

  • Saurabh J. Ullal
  • , Harmeet Singh
  • , John Daugherty
  • , Vahid Vahedi
  • , Eray S Aydil

Research output: Contribution to journal › Article › peer-review

15   Link opens in a new tab Scopus citations

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