Few-layer black phosporous PMOSFETs with BN/AI2O3 bilayer gate dielectric: Achieving Ion=850μA/μm, gm=340μS/μm, and Rc=0.58kΩ·μm

L. M. Yang, G. Qiu, M. W. Si, A. R. Charnas, C. A. Milligan, D. Y. Zemlyanov, H. Zhou, Y. C. Du, Y. M. Lin, W. Tsai, Qing Paduano, M. Snure, P. D. Ye

Research output: Chapter in Book/Report/Conference proceedingConference contribution

19 Scopus citations

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Material Science

Physics

Chemical Engineering