Fabrication of ultrasmall tunnel junctions by electron-beam lithography

S. J. Koester, G. Bazán, G. H. Bernstein, W. Porod

Research output: Contribution to journalArticlepeer-review

3 Scopus citations


Fabrication of a variety of ultrasmall tunneling structures is presented for possible applications in single electronics. Two main structures are described: (i) arrays of nanometer-scale metal dots and (ii) single and multiple linear tunnel junctions formed by overlapping lines. Very large, uniform particle arrays were fabricated by electron-beam lithography (EBL) with particle diameters as small as 25 nm. The advantage of our dot array system is its high degree of uniformity and very small junction size coupled with the use of isolated particles to reduce stray capacitance effects. Single and multiple linear tunnel junctions were fabricated by EBL using single-layer resist and angled evaporations. Our fabrication technique differs from previous ones in its ability to create very small tunnel junctions without the need for multilayer resist systems or precise knowledge of the angle of evaporation.

Original languageEnglish (US)
Pages (from-to)1918-1921
Number of pages4
JournalReview of Scientific Instruments
Issue number3
StatePublished - 1992


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