Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates

Zhaohui H. Yang; James R. Leger

doi:10.1117/1.2190627

Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates

Zhaohui H. Yang, James R. Leger

Electrical and Computer Engineering

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

Smooth patterns were written into PMGI electron-beam resist using electron-beam lithography on BK7 blank concave mirror substrates, resulting in aspheric optics with sag as large as 4 μm. Interference microscope measurements revealed that the fabricated optics had height accuracy of 10 nm. These optics were designed for flattop mode shaping in laser resonators. Excellent performance of these optics has been demonstrated by testing them as fixed phase-conjugate mirrors outside laser resonators, as well as mode-shaping mirrors within laser resonators.

Original language	English (US)
Article number	043401
Journal	Optical Engineering
Volume	45
Issue number	4
DOIs	https://doi.org/10.1117/1.2190627
State	Published - Apr 2006

Keywords

Aspheric optics
Electron-beam lithography
Laser-beam shaping
Phase conjugation
Vertical-cavity surface-emitting lasers

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10.1117/1.2190627

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abstract = "Smooth patterns were written into PMGI electron-beam resist using electron-beam lithography on BK7 blank concave mirror substrates, resulting in aspheric optics with sag as large as 4 μm. Interference microscope measurements revealed that the fabricated optics had height accuracy of 10 nm. These optics were designed for flattop mode shaping in laser resonators. Excellent performance of these optics has been demonstrated by testing them as fixed phase-conjugate mirrors outside laser resonators, as well as mode-shaping mirrors within laser resonators.",

keywords = "Aspheric optics, Electron-beam lithography, Laser-beam shaping, Phase conjugation, Vertical-cavity surface-emitting lasers",

author = "Yang, {Zhaohui H.} and Leger, {James R.}",

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AU - Yang, Zhaohui H.

AU - Leger, James R.

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N2 - Smooth patterns were written into PMGI electron-beam resist using electron-beam lithography on BK7 blank concave mirror substrates, resulting in aspheric optics with sag as large as 4 μm. Interference microscope measurements revealed that the fabricated optics had height accuracy of 10 nm. These optics were designed for flattop mode shaping in laser resonators. Excellent performance of these optics has been demonstrated by testing them as fixed phase-conjugate mirrors outside laser resonators, as well as mode-shaping mirrors within laser resonators.

AB - Smooth patterns were written into PMGI electron-beam resist using electron-beam lithography on BK7 blank concave mirror substrates, resulting in aspheric optics with sag as large as 4 μm. Interference microscope measurements revealed that the fabricated optics had height accuracy of 10 nm. These optics were designed for flattop mode shaping in laser resonators. Excellent performance of these optics has been demonstrated by testing them as fixed phase-conjugate mirrors outside laser resonators, as well as mode-shaping mirrors within laser resonators.

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KW - Electron-beam lithography

KW - Laser-beam shaping

KW - Phase conjugation

KW - Vertical-cavity surface-emitting lasers

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Fabrication of large-sag aspheric micro-optics with nanometer accuracy using electron-beam lithography on curved substrates

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