Fabrication of highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification

Keyphrases

• Chemical Etching 100%
• Nanograting 100%
• Femtosecond Laser Modification 100%
• Silicon via 100%
• Optics 33%
• Interaction Process 33%
• Material Removal 33%
• Mechatronics 33%
• Etching Process 33%
• Processing Procedure 33%
• Nanoelectronics 33%
• Fabrication Quality 33%
• Laser Scanning 33%
• Crystalline-amorphous 33%
• Scale Patterns 33%
• Light Illumination 33%
• Auxiliary Chemicals 33%
• Femtosecond Laser 33%
• Femtosecond Laser Direct Writing 33%
• Indoor Lighting 33%
• Surface Homogeneity 33%
• Periodic Surface Structures 33%
• Laser-induced Periodic Surface Structures (LIPSS) 33%
• Laser-material Interaction 33%
• Still Face 33%
• Applications in the Field 33%
• Structural Color 33%
• Nanograting Structures 33%

Engineering

• Femtosecond Laser 100%
• Laser Modification 100%
• Scale Cross 25%
• Potential Application 25%
• Sample Surface 25%
• Multiphoton Lithography 25%
• Etching Process 25%
• Nanoelectronics 25%
• Material Removal 25%
• Controllability 25%
• Induced Periodic Surface Structure 25%
• Laser Material Interaction 25%
• Periodic Surface Structure 25%

Material Science

• Silicon 100%
• Amorphous Material 50%
• Crystalline Material 50%
• Periodic Structure 50%
• Surface Structure 50%
• Laser Material 50%