Fabrication of high-Tc superconductors using ozone-assisted molecular beam epitaxy

V. S. Achutharaman, K. M. Beauchamp, N. Chandrasekhar, G. C. Spalding, B. R. Johnson, A. M. Goldman

Research output: Contribution to journalArticlepeer-review

21 Scopus citations

Abstract

Ozone-assisted molecular beam epitaxy (MBE) has been developed for growing high-Tc superconducting films. It involves the co-evaporation of their elemental constituents together with the use of ozone as a source of reactive oxygen. The advantage of using ozone over other forms of reactive oxygen is that it is stable enough to be prepared and delivered to the substrate in a very pure form using very simple apparatus, providing a well-characterized flow of oxidizing gas. Using ozone, a post-deposition anneal is not needed to produce films with high transition temperatures, and growth can be carried out at relatively low system pressures. As a consequence, the surface analysis using reflection high energy electron diffraction is possible during film growth. Recent refinements of ozone-assisted MBE directed at the YBa2Cu3O7-σ family of films are described here. The results indicate that this technique is very competitive for growing the highest quality superconducting films and should be ideal for fabricating structures.

Original languageEnglish (US)
Pages (from-to)14-20
Number of pages7
JournalThin Solid Films
Volume216
Issue number1
DOIs
StatePublished - Aug 28 1992

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