Abstract
One of the important challenges in nanoscale manufacturing is the construction of simultaneously patterned three dimensional structures, materials and devices. Since we live in a three dimensional world, such capabilities are needed to fully realize the capabilities of nanotechnology. We describe self-assembly processes based on utilizing intrinsic stress and inducing grain coalescence (extrinsic stress) in thin metal films that can be used to curve or fold lithographically patterned two dimensional (2D) panels into 3D structures. We discuss the use of intrinsic chromium (Cr) stresses and extrinsic stresses based on induced grain coalescence in tin (Sn) based structures with varying material composition to create a variety of lithographically patterned curved and polyhedral structures.
| Original language | English (US) |
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| Title of host publication | Instrumentation, Metrology, and Standards for Nanomanufacturing IV |
| DOIs | |
| State | Published - 2010 |
| Event | Instrumentation, Metrology, and Standards for Nanomanufacturing IV - San Diego, CA, United States Duration: Aug 2 2010 → Aug 4 2010 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 7767 |
| ISSN (Print) | 0277-786X |
Conference
| Conference | Instrumentation, Metrology, and Standards for Nanomanufacturing IV |
|---|---|
| Country/Territory | United States |
| City | San Diego, CA |
| Period | 8/2/10 → 8/4/10 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 9 Industry, Innovation, and Infrastructure
Keywords
- Nanofabrication
- nanotechnology
- self assembly
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