Fabrication and characterization of metal-oxide-semiconductor capacitor based on layer-by-layer self-assembled thin films

Keyphrases

• Self-assembled Thin Films 100%
• Capacitor-based 100%
• Metal-oxide-semiconductor Capacitor (MOSCAP) 100%
• CCD Camera 25%
• Low Temperature 25%
• Industrial Application 25%
• Silicon Wafer 25%
• Semiconductor Devices 25%
• Surface Roughness 25%
• White Light 25%
• High Reproducibility 25%
• Quartz Crystal Microbalance with Dissipation (QCM-D) 25%
• Vertical Dimension 25%
• Molecular Ordering 25%
• Shortest Processing Time 25%
• Insulating Layer 25%
• Capacitor Array 25%
• Lithographic Technique 25%
• P-type Silicon 25%
• Interferometric Microscope 25%
• N-type Silicon 25%
• Layer-by-layer Self-assembly 25%

Material Science

• Metal Oxide 100%
• Capacitor 100%
• Oxide Semiconductor 100%
• Thin Films 100%
• Silicon 16%
• Silicon Wafer 16%
• Semiconductor Device 16%
• Self Assembly 16%
• Surface Roughness 16%

Engineering

• Thin Films 100%
• Metal Oxide Semiconductor 100%
• Industrial Applications 16%
• Low-Temperature 16%
• Quartz Crystal Microbalance 16%
• Semiconductor Device 16%
• Insulating Layer 16%
• Silicon Wafer 16%
• Processing Time 16%