Extended fine structure analysis using electron beams

Robert L. Park, P. I. Cohen, T. L. Einstein, W. T. Elam

Research output: Contribution to journalArticlepeer-review

9 Scopus citations


Appearance potential spectroscopy has found use primarily as a core level probe of the electronic structure of solid surfaces. The observation of extended fine structure above appearance potential edges, analogous to that observed above X-ray adsorption edges, gives promise that atomic spacings in the surface region may also be determined. Most previous studies of appearance potentials have depended on observing changes in the soft X-ray yield. Poor detection efficiencies and low flourescence yields have limited the usefulness of this approach. Using the secondary electron yield, however, we have recently succeeded in observing fine structure extending more than 400 eV above appearance potential edges. We are currently employing this approach to study the structure of SiO2 films on Si substrates. Initial attempts at Fourier inversion and problems due to diffraction of the incident electron beam and multiple scattering effects will be discussed.

Original languageEnglish (US)
Pages (from-to)435-438
Number of pages4
JournalJournal of Crystal Growth
Issue numberC
StatePublished - Dec 1978

Bibliographical note

Funding Information:
This work was supported by the Office of Naval Research under grants N00014-75-C-0292 and N00014-77-C-0485, anfdMcaorymlapnudtiCngomfapcuitleitrieSscwieenrceeCreonvtiedre.d by the University * Present address: Department of Electrical Engineering, University of Minnesota, Minneapolis, Minnesota 55455 USA.


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