Experimental study of silane plasma nanoparticle formation in amorphous silicon thin films

S. Thompson, C. R. Perrey, T. J. Belich, C. Blackwell, C. B. Carter, J. Kakalios, U. Kortshagen

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

RF glow discharge deposited hydrogenated amorphous silicon films containing silicon nanocrystalline inclusions (a/nc-Si:H) films are investigated as a function of a thermal gradient applied across the silane plasma during film growth. The a/nc-Si:H films are synthesized from hydrogen-diluted silane plasmas when a capacitively-coupled plasma enhanced chemical vapor deposition reactor is operated at high gas chamber pressures. Plasma diagnostics and transmission electron microscopy image analysis of films deposited with and without a thermal gradient suggest that nanoparticle formation occurs within the plasma, rather than resulting from solid-state nucleation at the growing film surface.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium Proceedings
EditorsR. Collins, P.C. Taylor, M. Kondo, R. Carius, R. Biswas
Pages313-318
Number of pages6
Volume862
StatePublished - 2005
Event2005 Materials Research Society Spring Meeting - San Francisco, CA, United States
Duration: Mar 28 2005Apr 1 2005

Other

Other2005 Materials Research Society Spring Meeting
CountryUnited States
CitySan Francisco, CA
Period3/28/054/1/05

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