Experimental and theoretical study of two-dimensional ion flux uniformity at the wafer plane in inductively coupled plasmas

Keyphrases

• Two Dimensional 100%
• Inductively Coupled Plasma 100%
• Wafer 100%
• Ion Flux 100%
• Flux Uniformity 100%
• Reactor 40%
• Spatial Distribution 20%
• Silicon Wafer 20%
• Wafer Surface 20%
• Operating Parameters 20%
• Langmuir Probe 20%
• Electronegative 20%
• Attachment Rate 20%
• Diffusion Length 20%
• Dimensionless numbers 20%
• Gas Composition 20%
• Ion Diffusion 20%
• Ion Distribution 20%
• Energy Relaxation Length 20%
• Ionization Rate 20%
• Energy Relaxation 20%
• Two-dimensional Array 20%
• Skin Depth 20%
• Dimensionless Ratios 20%
• Feed Gas 20%
• Two-dimensional Fluids 20%
• Fluid Model 20%
• Reactor Geometry 20%
• Cl2 Gas 20%
• Inductively Coupled Plasma Etching 20%
• Planar Spiral Coil 20%
• Operating Variables 20%
• Electropositive 20%
• SF6 Gas 20%

Engineering

• Two Dimensional 100%
• Theoretical Study 100%
• Inductively Coupled Plasma 100%
• Length Scale 33%
• Dimensional Array 33%
• Operating Parameter 33%
• Mm Diameter 33%
• Fluid Model 33%
• Dimensionless Ratio 33%
• Diffusion Length 33%
• Spatial Variation 33%
• Silicon Wafer 33%
• Gas Composition 33%
• Relaxation Length 33%
• Spatial Distribution 33%
• Electron Energy 33%
• Dimensionless Number 33%