Enhancement of perpendicular magnetic anisotropy in Co/Ni multilayers by in situ annealing the Ta/Cu under-layers

Di Wu, Shaohai Chen, Zongzhi Zhang, B. Ma, Q. Y. Jin

Research output: Contribution to journalArticle

19 Scopus citations

Abstract

The perpendicular magnetic properties of glass/Ta/Cu/[Co/Ni]4/Ta multilayers can be efficiently tuned by in situ pre-annealing the Ta/Cu under-layers at various temperatures (TCu) before the deposition of the Co/Ni stack. As a result of the co-effect of fcc(111) texture and Cu surface roughness, the perpendicular anisotropy Ku and coercivity H c⊥ exhibit a similar non-monotonous dependence on the T Cu, showing minimum values at TCu = 100 °C and maxima at 400 °C for Ku while at 550 °C for Hc⊥. By in situ annealing the under-layers at 550 °C and then post-annealing the whole stack at 250 °C, the Hc⊥ value can be significantly enhanced from 139 Oe up to 620 Oe, which is important for spintronic applications.

Original languageEnglish (US)
Article number242401
JournalApplied Physics Letters
Volume103
Issue number24
DOIs
StatePublished - Dec 9 2013
Externally publishedYes

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