Abstract
Voltage-Gated Spin-Orbit-Torque (VGSOT) Magnetic Random-Access Memory (MRAM) is a promising candidate for reducing writing energy and improving writing speed in emerging memory and in-memory computing applications. However, conventional Voltage Controlled Magnetic Anisotropy (VCMA) approaches are often inefficient due to the low VCMA coefficient at the CoFeB/MgO interface. Additionally, traditional heavy metal/perpendicular magnetic anisotropy (PMA) ferromagnet bilayers require an external magnetic field to overcome symmetry constraints and achieve deterministic SOT switching. Here, a novel and industry-compatible SOT underlayer for next-generation VGSOT MRAM by employing a composite heavy metal tri-layer with a high work function is presented. This approach achieves a VCMA coefficient exceeding 100 fJ V−1m−1 through electron depletion effects, which is ten times larger than that observed with a pure W underlayer. Furthermore, it is demonstrated that this composite heavy metal SOT underlayer facilitates the integration of VCMA with opposite spin Hall angles, enabling field-free SOT switching in industry-compatible PMA CoFeB/MgO systems.
| Original language | English (US) |
|---|---|
| Article number | 2416570 |
| Journal | Advanced Functional Materials |
| Volume | 35 |
| Issue number | 10 |
| DOIs | |
| State | Published - Mar 4 2025 |
Bibliographical note
Publisher Copyright:© 2024 The Author(s). Advanced Functional Materials published by Wiley-VCH GmbH.
Keywords
- field-free magnetization switching
- opposite spin Hall angles
- spin-orbit torque material
- voltage-controlled magnetic anisotropic
- work function engineering
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