Abstract
The fabrication of refractive optical elements in SU-8 resist using electron-beam lithography was discussed. It was found that the elements all perform near the diffraction limit with rms surface variations between 1/10 wave and 1/7 wave. The electron scattering from the thick resist was measured and shown to limit the technique to optical elements with relatively smooth surface figures.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 1453-1458 |
| Number of pages | 6 |
| Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| Volume | 21 |
| Issue number | 4 |
| DOIs | |
| State | Published - 2003 |