Microwave and radio frequency (RF) sustained discharges play an important role in the field of plasma processing. For means of applications of microwave and RF plasmas the electron distribution function (EDF) in the plasma bulk and the ion energy distribution (IED) at the surrounding walls (electrodes or substrates) are equally important. In this paper a short review of the different effects governing EDFS and IEDS in microwave and RF plasmas is presented. Three aspects are treated in some detail: the differences of EDFS in DC and high-frequency sustained plasmas are pointed out. The spatial dependence of the EDF in low-pressure plasmas in the so called 'non-local regime' is investigated. Finally the different IEDS observed in capacitively and inductively coupled RF plasmas are discussed. For all three points theoretical as well as experimental results are presented.