Effects of annealing on the structure of Ta2N thin films deposited on Al2O3

James E. Angelo, N. R. Moody, S. K. Venkataraman, W. W. Gerberich

Research output: Contribution to journalConference articlepeer-review

4 Scopus citations


The microstructure of Ta2N thin films deposited by d.c. magnetron sputtering on (112̄0) surface of Al2O3 is investigated using transmission electron microscopy. The effects of exposing the thin film structure to a 600 °C air environment are also explored. It will be shown that under the standard deposition conditions, stresses exist in the thin film structure which leads to the formation of a textured structure in the as-deposited Ta2N. Exposure of the thin film structure to an air environment transforms the Ta2N to Ta2O5 in the orthorhombic structure. In addition, evidence for a epitaxial relationship between the Ta2O5 and Al2O3 will be presented.

Original languageEnglish (US)
Pages (from-to)195-200
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
StatePublished - Jan 1 1995
EventProceedings of the 1994 MRS Fall Meeting - Boston, MA, USA
Duration: Nov 28 1994Nov 30 1994


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