Effects Associated with Nanostructure Fabrication Using In Situ Liquid Cell TEM Technology

Xin Chen; Lihui Zhou; Ping Wang; Hongliang Cao; Xiaoli Miao; Feifei Wei; Xia Chen

doi:10.1007/s40820-015-0054-4

Effects Associated with Nanostructure Fabrication Using In Situ Liquid Cell TEM Technology

Xin Chen, Lihui Zhou, Ping Wang, Hongliang Cao, Xiaoli Miao, Feifei Wei, Xia Chen

Bioproducts and Biosystems Engineering

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

We studied silicon, carbon, and SiC_x nanostructures fabricated using liquid-phase electron-beam-induced deposition technology in transmission electron microscopy systems. Nanodots obtained from fixed electron beam irradiation followed a universal size versus beam dose trend, with precursor concentrations from pure SiCl₄ to 0 % SiCl₄ in CH₂Cl₂, and electron beam intensity ranges of two orders of magnitude, showing good controllability of the deposition. Secondary electrons contributed to the determination of the lateral sizes of the nanostructures, while the primary beam appeared to have an effect in reducing the vertical growth rate. These results can be used to generate donut-shaped nanostructures. Using a scanning electron beam, line structures with both branched and unbranched morphologies were also obtained. The liquid-phase electron-beam-induced deposition technology is shown to be an effective tool for advanced nanostructured material generation.

Original language	English (US)
Pages (from-to)	385-391
Number of pages	7
Journal	Nano-Micro Letters
Volume	7
Issue number	4
DOIs	https://doi.org/10.1007/s40820-015-0054-4
State	Published - Oct 1 2015

Bibliographical note

Funding Information:
The TEM experiment was carried out in part in the Frederick Seitz Materials Research Laboratory Central Facilities, University of Illinois, which are partially supported by the U.S. Department of Energy under grants DE-FG02-07ER46453 and DEFG02- 07ER46471. The authors thank S. J. Dillon, Y. Liu, K.-W. Noh, A. Shah, T. Shang, J. G. Wen, and J. M. Zuo for their kind help. The supports from the Shanghai Leading Academic Discipline Project (B502), the Shanghai Key Laboratory Project (08DZ2230500), the Science and Technology Commission of Shanghai Municipality (11nm0507000), the State Key Laboratory of Functional Materials for Informatics Open Project (SKL201306), the Shanghai Pujiang Program (13PJ1401700), and.

Keywords

Electron-beam-induced deposition
In situ TEM
Nanolithography
Nanostrucutre
Semiconductor

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title = "Effects Associated with Nanostructure Fabrication Using In Situ Liquid Cell TEM Technology",

abstract = "We studied silicon, carbon, and SiCx nanostructures fabricated using liquid-phase electron-beam-induced deposition technology in transmission electron microscopy systems. Nanodots obtained from fixed electron beam irradiation followed a universal size versus beam dose trend, with precursor concentrations from pure SiCl4 to 0 % SiCl4 in CH2Cl2, and electron beam intensity ranges of two orders of magnitude, showing good controllability of the deposition. Secondary electrons contributed to the determination of the lateral sizes of the nanostructures, while the primary beam appeared to have an effect in reducing the vertical growth rate. These results can be used to generate donut-shaped nanostructures. Using a scanning electron beam, line structures with both branched and unbranched morphologies were also obtained. The liquid-phase electron-beam-induced deposition technology is shown to be an effective tool for advanced nanostructured material generation.",

keywords = "Electron-beam-induced deposition, In situ TEM, Nanolithography, Nanostrucutre, Semiconductor",

author = "Xin Chen and Lihui Zhou and Ping Wang and Hongliang Cao and Xiaoli Miao and Feifei Wei and Xia Chen",

note = "Funding Information: The TEM experiment was carried out in part in the Frederick Seitz Materials Research Laboratory Central Facilities, University of Illinois, which are partially supported by the U.S. Department of Energy under grants DE-FG02-07ER46453 and DEFG02- 07ER46471. The authors thank S. J. Dillon, Y. Liu, K.-W. Noh, A. Shah, T. Shang, J. G. Wen, and J. M. Zuo for their kind help. The supports from the Shanghai Leading Academic Discipline Project (B502), the Shanghai Key Laboratory Project (08DZ2230500), the Science and Technology Commission of Shanghai Municipality (11nm0507000), the State Key Laboratory of Functional Materials for Informatics Open Project (SKL201306), the Shanghai Pujiang Program (13PJ1401700), and.",

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T1 - Effects Associated with Nanostructure Fabrication Using In Situ Liquid Cell TEM Technology

AU - Chen, Xin

AU - Zhou, Lihui

AU - Wang, Ping

AU - Cao, Hongliang

AU - Miao, Xiaoli

AU - Wei, Feifei

AU - Chen, Xia

N1 - Funding Information: The TEM experiment was carried out in part in the Frederick Seitz Materials Research Laboratory Central Facilities, University of Illinois, which are partially supported by the U.S. Department of Energy under grants DE-FG02-07ER46453 and DEFG02- 07ER46471. The authors thank S. J. Dillon, Y. Liu, K.-W. Noh, A. Shah, T. Shang, J. G. Wen, and J. M. Zuo for their kind help. The supports from the Shanghai Leading Academic Discipline Project (B502), the Shanghai Key Laboratory Project (08DZ2230500), the Science and Technology Commission of Shanghai Municipality (11nm0507000), the State Key Laboratory of Functional Materials for Informatics Open Project (SKL201306), the Shanghai Pujiang Program (13PJ1401700), and.

PY - 2015/10/1

Y1 - 2015/10/1

N2 - We studied silicon, carbon, and SiCx nanostructures fabricated using liquid-phase electron-beam-induced deposition technology in transmission electron microscopy systems. Nanodots obtained from fixed electron beam irradiation followed a universal size versus beam dose trend, with precursor concentrations from pure SiCl4 to 0 % SiCl4 in CH2Cl2, and electron beam intensity ranges of two orders of magnitude, showing good controllability of the deposition. Secondary electrons contributed to the determination of the lateral sizes of the nanostructures, while the primary beam appeared to have an effect in reducing the vertical growth rate. These results can be used to generate donut-shaped nanostructures. Using a scanning electron beam, line structures with both branched and unbranched morphologies were also obtained. The liquid-phase electron-beam-induced deposition technology is shown to be an effective tool for advanced nanostructured material generation.

AB - We studied silicon, carbon, and SiCx nanostructures fabricated using liquid-phase electron-beam-induced deposition technology in transmission electron microscopy systems. Nanodots obtained from fixed electron beam irradiation followed a universal size versus beam dose trend, with precursor concentrations from pure SiCl4 to 0 % SiCl4 in CH2Cl2, and electron beam intensity ranges of two orders of magnitude, showing good controllability of the deposition. Secondary electrons contributed to the determination of the lateral sizes of the nanostructures, while the primary beam appeared to have an effect in reducing the vertical growth rate. These results can be used to generate donut-shaped nanostructures. Using a scanning electron beam, line structures with both branched and unbranched morphologies were also obtained. The liquid-phase electron-beam-induced deposition technology is shown to be an effective tool for advanced nanostructured material generation.

KW - Electron-beam-induced deposition

KW - In situ TEM

KW - Nanolithography

KW - Nanostrucutre

KW - Semiconductor

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