Effect of water vapor on plasma processing at atmospheric pressure: Polymer etching and surface modification by an Ar/H2O plasma jet

Pingshan Luan, V. S.Santosh K. Kondeti, Andrew J. Knoll, Peter J. Bruggeman, Gottlieb S. Oehrlein

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

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Physics