Effect of Oblique Versus Normal Deposition on the Properties of Perpendicularly Magnetized L1₀FePd Thin Films

Keyphrases

• FePd 100%
• Buffer Layer 50%
• Sputtering Target 50%
• X-ray 25%
• Crystallization 25%
• Magnetic Properties 25%
• CRISTAL 25%
• Anisotropy 25%
• Seed Layer 25%
• Diffraction 25%
• Processing Parameters 25%
• Magnetron Sputtering 25%
• Deposition Temperature 25%
• Gilbert Damping 25%
• Dynamic Properties 25%
• Static Properties 25%
• Perpendicular Magnetic Anisotropy 25%
• Oblique Angle 25%
• Inclination Angle 25%
• High Thermal Stability 25%
• Sputter-deposited 25%
• Magnetic Memory 25%
• Strong Degree 25%
• PtRu 25%
• Memory Element 25%
• Vibrating Sample Magnetometry 25%
• Oblique Orientation 25%
• Magnetic Anisotropy Energy 25%
• Substrate Deposition 25%
• Fe-based Alloy 25%
• Substrate Layer 25%
• Ferromagnetic Resonance Spectroscopy 25%
• Pt-Ir 25%
• Ru(II) Complexes 25%

Engineering

• Thin Films 100%
• Buffer Layer 100%
• Anisotropy 100%
• Deposited Film 50%
• Magnetron 50%
• Deposition Temperature 50%
• Seed Layer 50%
• Anisotropy Energy 50%
• Processing Parameter 50%
• Dynamic Property 50%
• Alloy 50%
• Crystal Structure 50%
• Magnetic Storage 50%
• X Ray Diffraction 50%
• Vibrating sample magnetometry 50%

Material Science

• Anisotropy 100%
• Thin Films 100%
• Film 66%
• Buffer Layer 66%
• Magnetic Property 33%
• Magnetic Memory 33%
• X-Ray Diffraction 33%
• Thermal Stability 33%
• Alloy 33%
• Crystal Structure 33%