Effect of guiding layer topography on chemoepitaxially directed self-assembly of block copolymers for pattern density multiplication

Benjamin D. Nation, Andrew J Peters, Richard A. Lawson, Peter J. Ludovice, Clifford L. Henderson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

Chemoepitaxy is often used to induce pattern density multiplication in the directed self-assembly (DSA) of block copolymers (BCPs) by using a chemically patterned guiding underlayer. This underlayer is often viewed as being a flat underlayer composed of a pinning stripe region and a neutral stripe region, where the pinning stripe is a region highly preferential to one phase of the BCP and the neutral stripe is a region that is slightly preferential to the other phase of the BCP that is not attracted by the pinning stripe. However, in producing these chemoepitaxial patterns, it is likely that unexpected topography might be introduced into the system, which may adversely affect the ability for the underlayer to guide the phase separation of the BCP film, and may deform any resulting lamellae. The current work presented in this paper explores the effect that topography in these chemoepitaxial underlayers has on the alignment of the BCP film. These underlayer effects have been evaluated using detailed mesoscale molecular dynamics simulations.

Original languageEnglish (US)
Title of host publicationAlternative Lithographic Technologies VI
PublisherSPIE
ISBN (Print)9780819499721
DOIs
StatePublished - Jan 1 2014
EventAlternative Lithographic Technologies VI - San Jose, CA, United States
Duration: Feb 24 2014Feb 27 2014

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9049
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceAlternative Lithographic Technologies VI
CountryUnited States
CitySan Jose, CA
Period2/24/142/27/14

Keywords

  • Block copolymer
  • Chemoepitaxy
  • Computational
  • Directed self-assembly
  • Simulation
  • Topography

Fingerprint Dive into the research topics of 'Effect of guiding layer topography on chemoepitaxially directed self-assembly of block copolymers for pattern density multiplication'. Together they form a unique fingerprint.

  • Cite this

    Nation, B. D., Peters, A. J., Lawson, R. A., Ludovice, P. J., & Henderson, C. L. (2014). Effect of guiding layer topography on chemoepitaxially directed self-assembly of block copolymers for pattern density multiplication. In Alternative Lithographic Technologies VI [90492K] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9049). SPIE. https://doi.org/10.1117/12.2046629