Effect of guiding layer topography on chemoepitaxially directed self-assembly of block copolymers for pattern density multiplication

Benjamin D. Nation, Andrew Peters, Richard A. Lawson, Peter J. Ludovice, Clifford L. Henderson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Chemoepitaxy is often used to induce pattern density multiplication in the directed self-assembly (DSA) of block copolymers (BCPs) by using a chemically patterned guiding underlayer. This underlayer is often viewed as being a flat underlayer composed of a pinning stripe region and a neutral stripe region, where the pinning stripe is a region highly preferential to one phase of the BCP and the neutral stripe is a region that is slightly preferential to the other phase of the BCP that is not attracted by the pinning stripe. However, in producing these chemoepitaxial patterns, it is likely that unexpected topography might be introduced into the system, which may adversely affect the ability for the underlayer to guide the phase separation of the BCP film, and may deform any resulting lamellae. The current work presented in this paper explores the effect that topography in these chemoepitaxial underlayers has on the alignment of the BCP film. These underlayer effects have been evaluated using detailed mesoscale molecular dynamics simulations.

Original languageEnglish (US)
Title of host publicationAlternative Lithographic Technologies VI
PublisherSPIE
Volume9049
ISBN (Print)9780819499721
DOIs
StatePublished - Jan 1 2014
EventAlternative Lithographic Technologies VI - San Jose, CA, United States
Duration: Feb 24 2014Feb 27 2014

Other

OtherAlternative Lithographic Technologies VI
CountryUnited States
CitySan Jose, CA
Period2/24/142/27/14

Fingerprint

Block Copolymers
Self-assembly
Topography
block copolymers
multiplication
Self assembly
Block copolymers
self assembly
topography
Multiplication
Phase Separation
lamella
Phase separation
Molecular Dynamics Simulation
Molecular dynamics
Alignment
Likely
alignment
molecular dynamics
Computer simulation

Keywords

  • Block copolymer
  • Chemoepitaxy
  • Computational
  • Directed self-assembly
  • Simulation
  • Topography

Cite this

Nation, B. D., Peters, A., Lawson, R. A., Ludovice, P. J., & Henderson, C. L. (2014). Effect of guiding layer topography on chemoepitaxially directed self-assembly of block copolymers for pattern density multiplication. In Alternative Lithographic Technologies VI (Vol. 9049). [90492K] SPIE. https://doi.org/10.1117/12.2046629

Effect of guiding layer topography on chemoepitaxially directed self-assembly of block copolymers for pattern density multiplication. / Nation, Benjamin D.; Peters, Andrew; Lawson, Richard A.; Ludovice, Peter J.; Henderson, Clifford L.

Alternative Lithographic Technologies VI. Vol. 9049 SPIE, 2014. 90492K.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Nation, BD, Peters, A, Lawson, RA, Ludovice, PJ & Henderson, CL 2014, Effect of guiding layer topography on chemoepitaxially directed self-assembly of block copolymers for pattern density multiplication. in Alternative Lithographic Technologies VI. vol. 9049, 90492K, SPIE, Alternative Lithographic Technologies VI, San Jose, CA, United States, 2/24/14. https://doi.org/10.1117/12.2046629
Nation BD, Peters A, Lawson RA, Ludovice PJ, Henderson CL. Effect of guiding layer topography on chemoepitaxially directed self-assembly of block copolymers for pattern density multiplication. In Alternative Lithographic Technologies VI. Vol. 9049. SPIE. 2014. 90492K https://doi.org/10.1117/12.2046629
Nation, Benjamin D. ; Peters, Andrew ; Lawson, Richard A. ; Ludovice, Peter J. ; Henderson, Clifford L. / Effect of guiding layer topography on chemoepitaxially directed self-assembly of block copolymers for pattern density multiplication. Alternative Lithographic Technologies VI. Vol. 9049 SPIE, 2014.
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