Keyphrases
Optical Properties
100%
Structural Properties
100%
Growth Temperature
100%
Electrical Properties
100%
ZnO Thin Films
100%
Ion Beam
100%
Dual-ion
100%
ZnO Film
75%
Substrate Temperature
50%
Emission Peak
50%
Near-band-edge Emission
50%
Deep-level Emission
50%
Room Temperature
25%
Morphological Properties
25%
Si (100) Substrate
25%
Preferred Orientation
25%
Spectroscopy Studies
25%
Native Defects
25%
Surface Morphology
25%
Minimum Value
25%
Photoluminescence Measurements
25%
X-ray Photoelectron Spectroscopy
25%
Oxygen Vacancy
25%
Resistivity
25%
As-deposited
25%
Crystal Quality
25%
Visible Spectrum
25%
Chamber Pressure
25%
Depositional System
25%
Mixed Gas
25%
Oxygen Interstitials
25%
Epitaxial Thin Film
25%
Surface Electrical Properties
25%
Surface Optical Properties
25%
Vacancy Point-defect
25%
Defect Properties
25%
Dual Ion Beam Sputtering
25%
Oxygen Percentage
25%
X-ray Diffraction (XRD) Analysis
25%
P-type Si
25%
Interstitial Point Defect
25%
Engineering
Thin Films
100%
Growth Temperature
100%
Band Edge
50%
Deep Level
50%
Emission Peak
50%
Resistive
25%
Ray Photoelectron Spectroscopy
25%
Substrate Temperature
25%
Deposition System
25%
Chamber Pressure
25%
Spectral Range
25%
Increasing Substrate Temperature
25%
Interstitial Oxygen
25%
Crystalline Quality
25%
X-Ray Diffraction Analysis
25%
Room Temperature
25%
Surface Morphology
25%
Preferred Orientation
25%
Material Science
ZnO
100%
Optical Property
100%
Thin Films
100%
Film
62%
Point Defect
25%
Photoluminescence
12%
Electrical Resistivity
12%
X-Ray Photoelectron Spectroscopy
12%
Surface Morphology
12%
X Ray Diffraction Analysis
12%