| Original language | English (US) |
|---|---|
| Pages (from-to) | iii |
| Journal | ECS Transactions |
| Volume | 6 |
| Issue number | 1 |
| State | Published - 2007 |
| Event | International Symposium on Advanced Gate Stack, Source/Drain and Channel Engineering for Si-based CMOS: New Materials, Processes and Equipment, 3 - 211th ECS Meeting - Chicago, IL, United States Duration: May 6 2007 → May 10 2007 |
ECS Transactions: Preface
M. Öztürk, H. Iwai, D. L. Kwong, P. J. Timans, E. P. Gusev, S. J. Koester, F. Roozeboom
Research output: Contribution to journal › Editorial › peer-review
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