Dynamics of the leveling process of nanoindentation induced defects on thin polystyrene films

Keyphrases

• Nanoindentation 100%
• Polystyrene 100%
• Polystyrene Films 100%
• Level Process 100%
• Induced Defects 100%
• Penetration Depth 50%
• Process-based 50%
• Atomic Force Microscopy 50%
• Glass Transition Temperature 50%
• Diffusion Process 50%
• Film Thickness 50%
• Diffusivity 50%
• Silicon Substrate 50%
• Self-diffusivity 50%
• Spin-casting 50%
• Residual Depth 50%
• Curvature Gradient 50%

Material Science

• Nanoindentation 100%
• Film 100%
• Polystyrene 100%
• Diffusivity 50%
• Silicon 25%
• Glass Transition Temperature 25%
• Film Thickness 25%
• Atomic Force Microscopy 25%

Engineering

• Diffusivity 100%
• Induced Defect 100%
• Atomic Force Microscopy 50%
• Silicon Substrate 50%
• Diffusion Process 50%
• Spin Cast 50%