Directed self-assembly of silicon-containing block copolymer thin films

Michael J. Maher, Charles T. Rettner, Christopher M. Bates, Gregory Blachut, Matthew C. Carlson, William J. Durand, Christopher J. Ellison, Daniel P. Sanders, Joy Y. Cheng, C. Grant Willson

Research output: Contribution to journalArticle

53 Scopus citations

Abstract

The directed self-assembly (DSA) of lamella-forming poly(styrene-block-trimethylsilylstyrene) (PS-PTMSS, L0 = 22 nm) was achieved using a combination of tailored top interfaces and lithographically defined patterned substrates. Chemo- and grapho-epitaxy, using hydrogen silsesquioxane (HSQ) based prepatterns, achieved density multiplications up to 6× and trench space subdivisions up to 7×, respectively. These results establish the compatibility of DSA techniques with a high etch contrast, Si-containing BCP that requires a top coat neutral layer to enable orientation.

Original languageEnglish (US)
Pages (from-to)3323-3328
Number of pages6
JournalACS Applied Materials and Interfaces
Volume7
Issue number5
DOIs
StatePublished - Jan 1 2015

Keywords

  • block copolymers
  • chemo-epitaxy
  • directed self-assembly
  • grapho-epitaxy
  • lithography
  • top coats

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