Directed self-assembly of silicon-containing block copolymer thin films

Michael J. Maher, Charles T. Rettner, Christopher M. Bates, Gregory Blachut, Matthew C. Carlson, William J. Durand, Christopher J. Ellison, Daniel P. Sanders, Joy Y. Cheng, C. Grant Willson

Research output: Contribution to journalArticlepeer-review

64 Scopus citations


The directed self-assembly (DSA) of lamella-forming poly(styrene-block-trimethylsilylstyrene) (PS-PTMSS, L0 = 22 nm) was achieved using a combination of tailored top interfaces and lithographically defined patterned substrates. Chemo- and grapho-epitaxy, using hydrogen silsesquioxane (HSQ) based prepatterns, achieved density multiplications up to 6× and trench space subdivisions up to 7×, respectively. These results establish the compatibility of DSA techniques with a high etch contrast, Si-containing BCP that requires a top coat neutral layer to enable orientation.

Original languageEnglish (US)
Pages (from-to)3323-3328
Number of pages6
JournalACS Applied Materials and Interfaces
Issue number5
StatePublished - Jan 1 2015


  • block copolymers
  • chemo-epitaxy
  • directed self-assembly
  • grapho-epitaxy
  • lithography
  • top coats


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