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Directed self-assembly of poly(styrene)-block-poly(acrylic acid) copolymers for sub-20nm pitch patterning
Jing Cheng, Richard A. Lawson, Wei Ming Yeh, Nathan D. Jarnagin, Andrew Peters, Laren M. Tolbert, Clifford L. Henderson
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
3
Scopus
citations