Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae

Austin P. Lane; Xiaomin Yang; Michael J. Maher; Gregory Blachut; Yusuke Asano; Yasunobu Someya; Akhila Mallavarapu; Stephen M. Sirard; Christopher J. Ellison; C. Grant Willson

doi:10.1021/acsnano.7b02698

Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae

Austin P. Lane, Xiaomin Yang, Michael J. Maher, Gregory Blachut, Yusuke Asano, Yasunobu Someya, Akhila Mallavarapu, Stephen M. Sirard, Christopher J. Ellison, C. Grant Willson

Chemical Engineering and Materials Science

Research output: Contribution to journal › Article › peer-review

113 Scopus citations

Abstract

The directed self-assembly (DSA) and pattern transfer of poly(5-vinyl-1,3-benzodioxole-block-pentamethyldisilylstyrene) (PVBD-b-PDSS) is reported. Lamellae-forming PVBD-b-PDSS can form well resolved 5 nm (half-pitch) features in thin films with high etch selectivity. Reactive ion etching was used to selectively remove the PVBD block, and fingerprint patterns were subsequently transferred into an underlying chromium hard mask and carbon layer. DSA of the block copolymer (BCP) features resulted from orienting PVBD-b-PDSS on guidelines patterned by nanoimprint lithography. A density multiplication factor of 4× was achieved through a hybrid chemo-/grapho-epitaxy process. Cross-sectional scanning tunneling electron microscopy/electron energy loss spectroscopy (STEM/EELS) was used to analyze the BCP profile in the DSA samples. Wetting layers of parallel orientation were observed to form unless the bottom and top surface were neutralized with a surface treatment and top coat, respectively.

Original language	English (US)
Pages (from-to)	7656-7665
Number of pages	10
Journal	ACS nano
Volume	11
Issue number	8
DOIs	https://doi.org/10.1021/acsnano.7b02698
State	Published - Aug 22 2017

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Publisher Copyright:
© 2017 American Chemical Society.

Keywords

bit-patterned media
block copolymer
directed self-assembly
lithography
nanoimprint lithography
nanopatterning

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10.1021/acsnano.7b02698

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title = "Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae",

abstract = "The directed self-assembly (DSA) and pattern transfer of poly(5-vinyl-1,3-benzodioxole-block-pentamethyldisilylstyrene) (PVBD-b-PDSS) is reported. Lamellae-forming PVBD-b-PDSS can form well resolved 5 nm (half-pitch) features in thin films with high etch selectivity. Reactive ion etching was used to selectively remove the PVBD block, and fingerprint patterns were subsequently transferred into an underlying chromium hard mask and carbon layer. DSA of the block copolymer (BCP) features resulted from orienting PVBD-b-PDSS on guidelines patterned by nanoimprint lithography. A density multiplication factor of 4× was achieved through a hybrid chemo-/grapho-epitaxy process. Cross-sectional scanning tunneling electron microscopy/electron energy loss spectroscopy (STEM/EELS) was used to analyze the BCP profile in the DSA samples. Wetting layers of parallel orientation were observed to form unless the bottom and top surface were neutralized with a surface treatment and top coat, respectively.",

keywords = "bit-patterned media, block copolymer, directed self-assembly, lithography, nanoimprint lithography, nanopatterning",

author = "Lane, {Austin P.} and Xiaomin Yang and Maher, {Michael J.} and Gregory Blachut and Yusuke Asano and Yasunobu Someya and Akhila Mallavarapu and Sirard, {Stephen M.} and Ellison, {Christopher J.} and Willson, {C. Grant}",

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doi = "10.1021/acsnano.7b02698",

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AU - Lane, Austin P.

AU - Yang, Xiaomin

AU - Maher, Michael J.

AU - Blachut, Gregory

AU - Asano, Yusuke

AU - Someya, Yasunobu

AU - Mallavarapu, Akhila

AU - Sirard, Stephen M.

AU - Ellison, Christopher J.

AU - Willson, C. Grant

PY - 2017/8/22

Y1 - 2017/8/22

N2 - The directed self-assembly (DSA) and pattern transfer of poly(5-vinyl-1,3-benzodioxole-block-pentamethyldisilylstyrene) (PVBD-b-PDSS) is reported. Lamellae-forming PVBD-b-PDSS can form well resolved 5 nm (half-pitch) features in thin films with high etch selectivity. Reactive ion etching was used to selectively remove the PVBD block, and fingerprint patterns were subsequently transferred into an underlying chromium hard mask and carbon layer. DSA of the block copolymer (BCP) features resulted from orienting PVBD-b-PDSS on guidelines patterned by nanoimprint lithography. A density multiplication factor of 4× was achieved through a hybrid chemo-/grapho-epitaxy process. Cross-sectional scanning tunneling electron microscopy/electron energy loss spectroscopy (STEM/EELS) was used to analyze the BCP profile in the DSA samples. Wetting layers of parallel orientation were observed to form unless the bottom and top surface were neutralized with a surface treatment and top coat, respectively.

AB - The directed self-assembly (DSA) and pattern transfer of poly(5-vinyl-1,3-benzodioxole-block-pentamethyldisilylstyrene) (PVBD-b-PDSS) is reported. Lamellae-forming PVBD-b-PDSS can form well resolved 5 nm (half-pitch) features in thin films with high etch selectivity. Reactive ion etching was used to selectively remove the PVBD block, and fingerprint patterns were subsequently transferred into an underlying chromium hard mask and carbon layer. DSA of the block copolymer (BCP) features resulted from orienting PVBD-b-PDSS on guidelines patterned by nanoimprint lithography. A density multiplication factor of 4× was achieved through a hybrid chemo-/grapho-epitaxy process. Cross-sectional scanning tunneling electron microscopy/electron energy loss spectroscopy (STEM/EELS) was used to analyze the BCP profile in the DSA samples. Wetting layers of parallel orientation were observed to form unless the bottom and top surface were neutralized with a surface treatment and top coat, respectively.

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KW - nanoimprint lithography

KW - nanopatterning

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Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae

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