Directed assembly of lamellae forming block copolymer thin films near the order-disorder transition

Sangwon Kim; Paul F. Nealey; Frank S. Bates

doi:10.1021/nl403628d

Directed assembly of lamellae forming block copolymer thin films near the order-disorder transition

Sangwon Kim
, Paul F. Nealey
, Frank S. Bates

Chemical Engineering and Materials Science

Research output: Contribution to journal › Article › peer-review

57 Scopus citations

Abstract

The impact of thin film confinement on the ordering of lamellae was investigated using symmetric poly(styrene-b-[isoprene-ran-epoxyisoprene]) diblock copolymers bound by nonpreferential wetting interfaces. The order-disorder transition temperature (T_ODT) and the occurrence of composition fluctuations in the disordered state are not significantly affected by two-dimensional confinement. Directed self-assembly using chemical patterning is demonstrated near T_ODT. These results establish the minimum feature size attainable using directed self-assembly of a given diblock copolymer system.

Original language	English (US)
Pages (from-to)	148-152
Number of pages	5
Journal	Nano letters
Volume	14
Issue number	1
DOIs	https://doi.org/10.1021/nl403628d
State	Published - Jan 8 2014

Keywords

Block copolymer
directed self-assembly
fluctuation
lithography
thin film

Publisher link

10.1021/nl403628d

Find It

Find It at U of M Libraries

Cite this

@article{6d6591defbfa46be80a9f06c49e9a5e2,

title = "Directed assembly of lamellae forming block copolymer thin films near the order-disorder transition",

abstract = "The impact of thin film confinement on the ordering of lamellae was investigated using symmetric poly(styrene-b-[isoprene-ran-epoxyisoprene]) diblock copolymers bound by nonpreferential wetting interfaces. The order-disorder transition temperature (TODT) and the occurrence of composition fluctuations in the disordered state are not significantly affected by two-dimensional confinement. Directed self-assembly using chemical patterning is demonstrated near TODT. These results establish the minimum feature size attainable using directed self-assembly of a given diblock copolymer system.",

keywords = "Block copolymer, directed self-assembly, fluctuation, lithography, thin film",

author = "Sangwon Kim and Nealey, \{Paul F.\} and Bates, \{Frank S.\}",

year = "2014",

month = jan,

day = "8",

doi = "10.1021/nl403628d",

language = "English (US)",

volume = "14",

pages = "148--152",

journal = "Nano letters",

issn = "1530-6984",

publisher = "American Chemical Society",

number = "1",

}

TY - JOUR

T1 - Directed assembly of lamellae forming block copolymer thin films near the order-disorder transition

AU - Kim, Sangwon

AU - Nealey, Paul F.

AU - Bates, Frank S.

PY - 2014/1/8

Y1 - 2014/1/8

N2 - The impact of thin film confinement on the ordering of lamellae was investigated using symmetric poly(styrene-b-[isoprene-ran-epoxyisoprene]) diblock copolymers bound by nonpreferential wetting interfaces. The order-disorder transition temperature (TODT) and the occurrence of composition fluctuations in the disordered state are not significantly affected by two-dimensional confinement. Directed self-assembly using chemical patterning is demonstrated near TODT. These results establish the minimum feature size attainable using directed self-assembly of a given diblock copolymer system.

AB - The impact of thin film confinement on the ordering of lamellae was investigated using symmetric poly(styrene-b-[isoprene-ran-epoxyisoprene]) diblock copolymers bound by nonpreferential wetting interfaces. The order-disorder transition temperature (TODT) and the occurrence of composition fluctuations in the disordered state are not significantly affected by two-dimensional confinement. Directed self-assembly using chemical patterning is demonstrated near TODT. These results establish the minimum feature size attainable using directed self-assembly of a given diblock copolymer system.

KW - Block copolymer

KW - directed self-assembly

KW - fluctuation

KW - lithography

KW - thin film

UR - https://www.scopus.com/pages/publications/84892143414

UR - https://www.scopus.com/pages/publications/84892143414#tab=citedBy

U2 - 10.1021/nl403628d

DO - 10.1021/nl403628d

M3 - Article

AN - SCOPUS:84892143414

SN - 1530-6984

VL - 14

SP - 148

EP - 152

JO - Nano letters

JF - Nano letters

IS - 1

ER -

Directed assembly of lamellae forming block copolymer thin films near the order-disorder transition

Abstract

Keywords

Publisher link

Find It

Other files and links

Fingerprint

Cite this