Directed assembly of lamellae forming block copolymer thin films near the order-disorder transition

Sangwon Kim, Paul F. Nealey, Frank S. Bates

Research output: Contribution to journalArticle

37 Scopus citations

Abstract

The impact of thin film confinement on the ordering of lamellae was investigated using symmetric poly(styrene-b-[isoprene-ran-epoxyisoprene]) diblock copolymers bound by nonpreferential wetting interfaces. The order-disorder transition temperature (TODT) and the occurrence of composition fluctuations in the disordered state are not significantly affected by two-dimensional confinement. Directed self-assembly using chemical patterning is demonstrated near TODT. These results establish the minimum feature size attainable using directed self-assembly of a given diblock copolymer system.

Original languageEnglish (US)
Pages (from-to)148-152
Number of pages5
JournalNano letters
Volume14
Issue number1
DOIs
StatePublished - Jan 8 2014

Keywords

  • Block copolymer
  • directed self-assembly
  • fluctuation
  • lithography
  • thin film

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