Abstract
Non-ferromagnetic Co-C thin films were magnetically patterned by electron-beam direct writing. Co50C50 films with thickness of 30-60 nm were prepared by alternately sputtering Co and C films onto C-buffered glass substrates. The as-deposited Co50C50 films are amorphous and nonferromagnetic. Magnetic patterning of the as-deposited Co50C50 film was realized by subjecting it to electron-beam radiation using a focused 30kev beam with a current of 6.6 nA and a dwell time per dot of 3.8 s and longer. The smallest magnetic dot diameter produced by a dwell time per dot of 3.8 s is about 270 nm. The magnetic dot diameter increases linearly with the square root of dwell time per dot, which implies that the magnetic dots are produced by heat-conduction-induced phase change in the film. The magnetic measurements show that the dots are magnetically soft. The present nanolithography is potentially a flexible alternative to fabricate patterned magnetic nanostructures for submicrometer magnetic devices.
Original language | English (US) |
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Pages (from-to) | 1970-1972 |
Number of pages | 3 |
Journal | IEEE Transactions on Magnetics |
Volume | 38 |
Issue number | 5 I |
DOIs | |
State | Published - Sep 2002 |
Event | 2002 International Magnetics Conference (Intermag 2002) - Amsterdam, Netherlands Duration: Apr 28 2002 → May 2 2002 |
Keywords
- CoC thin films
- Electron-beam radiation
- Magnetic phase change
- Patterned magnetic nanostructure