Direct magnetic patterning of nonferromagnetic Co-C thin films by electron-beam radiation

T. J. Zhou, Y. Zhao, J. P. Wang, T. C. Chong, J. T.L. Thong

Research output: Contribution to journalConference articlepeer-review

5 Scopus citations


Non-ferromagnetic Co-C thin films were magnetically patterned by electron-beam direct writing. Co50C50 films with thickness of 30-60 nm were prepared by alternately sputtering Co and C films onto C-buffered glass substrates. The as-deposited Co50C50 films are amorphous and nonferromagnetic. Magnetic patterning of the as-deposited Co50C50 film was realized by subjecting it to electron-beam radiation using a focused 30kev beam with a current of 6.6 nA and a dwell time per dot of 3.8 s and longer. The smallest magnetic dot diameter produced by a dwell time per dot of 3.8 s is about 270 nm. The magnetic dot diameter increases linearly with the square root of dwell time per dot, which implies that the magnetic dots are produced by heat-conduction-induced phase change in the film. The magnetic measurements show that the dots are magnetically soft. The present nanolithography is potentially a flexible alternative to fabricate patterned magnetic nanostructures for submicrometer magnetic devices.

Original languageEnglish (US)
Pages (from-to)1970-1972
Number of pages3
JournalIEEE Transactions on Magnetics
Issue number5 I
StatePublished - Sep 2002
Event2002 International Magnetics Conference (Intermag 2002) - Amsterdam, Netherlands
Duration: Apr 28 2002May 2 2002


  • CoC thin films
  • Electron-beam radiation
  • Magnetic phase change
  • Patterned magnetic nanostructure


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