Abstract
Conventional electron beam lithography (EBL) has been used for fabricating patterned nanostructure, however, it involves the cumbersome process of resist coating, etching, lift-off, etc., which greatly complicates the production of patterned nanostructures. Mask-assistant ion beam mixing of multilayer films has been proposed but demonstrated low-resolution. A novel method involving direct magnetic patterning of a non-magnetic film by e-beam radiation induced nano-scale phase change is proposed in this paper, and preliminary results are presented. Metastable amorphous Co-C thin films were selected for this study.
Original language | English (US) |
---|---|
Title of host publication | INTERMAG Europe 2002 - IEEE International Magnetics Conference |
Editors | J. Fidler, B. Hillebrands, C. Ross, D. Weller, L. Folks, E. Hill, M. Vazquez Villalabeitia, J. A. Bain, Jo De Boeck, R. Wood |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
ISBN (Electronic) | 0780373650, 9780780373655 |
DOIs | |
State | Published - 2002 |
Event | 2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 - Amsterdam, Netherlands Duration: Apr 28 2002 → May 2 2002 |
Publication series
Name | INTERMAG Europe 2002 - IEEE International Magnetics Conference |
---|
Other
Other | 2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 |
---|---|
Country/Territory | Netherlands |
City | Amsterdam |
Period | 4/28/02 → 5/2/02 |
Bibliographical note
Publisher Copyright:©2002 IEEE.