Direct magnetic patterning of non-magnetic Co/C thin films by electron-beam radiation

T. J. Zhou, Y. Zhao, J. P. Wang, T. C. Chong, J. T L Thong

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Conventional electron beam lithography (EBL) has been used for fabricating patterned nanostructure, however, it involves the cumbersome process of resist coating, etching, lift-off, etc., which greatly complicates the production of patterned nanostructures. Mask-assistant ion beam mixing of multilayer films has been proposed but demonstrated low-resolution. A novel method involving direct magnetic patterning of a non-magnetic film by e-beam radiation induced nano-scale phase change is proposed in this paper, and preliminary results are presented. Metastable amorphous Co-C thin films were selected for this study.

Original languageEnglish (US)
Title of host publicationINTERMAG Europe 2002 - IEEE International Magnetics Conference
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)0780373650, 9780780373655
DOIs
StatePublished - 2002
Event2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 - Amsterdam, Netherlands
Duration: Apr 28 2002May 2 2002

Other

Other2002 IEEE International Magnetics Conference, INTERMAG Europe 2002
CountryNetherlands
CityAmsterdam
Period4/28/025/2/02

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    Zhou, T. J., Zhao, Y., Wang, J. P., Chong, T. C., & Thong, J. T. L. (2002). Direct magnetic patterning of non-magnetic Co/C thin films by electron-beam radiation. In INTERMAG Europe 2002 - IEEE International Magnetics Conference [1001308] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/INTMAG.2002.1001308