Detection of aluminum particles during the chemical vapor deposition of aluminum films using tertiaryamine complexes of alane (AIH 3 )

Michael G. Simmonds, Wayne L Gladfelter, Nagaraja Rao, Wladyslaw W. Szymanski, Kang Ho Ahn, Peter H McMurry

Research output: Contribution to journalLetter

36 Citations (Scopus)

Abstract

Two methods of analyzing particles were interfaced to a low pressure chemical vapor deposition (CVD) reactor to evaluate whether or not particles were formed in the gas phase during the growth of aluminum films using tertiaryamine complexes of alane. A laser light scattering particle counter was used to detect large (> 200 nm) particles in real time and established that the appearance of particles corresponded to the flow of precursor into the CVD reactor. A particle impaction system was used to collect particles (> 20 nm) for analysis using analytical electron microscopy and electron diffraction. This established that the particles were crystalline aluminum and that the particle sizes ranged from 20–700 nm. The median size was 85 nm.

Original languageEnglish (US)
Pages (from-to)2782-2784
Number of pages3
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume9
Issue number5
DOIs
StatePublished - Jan 1 1991

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Aluminum
Chemical vapor deposition
vapor deposition
aluminum
Low pressure chemical vapor deposition
Radiation counters
Electron diffraction
Light scattering
Electron microscopy
Gases
Particle size
Crystalline materials
Lasers
reactors
radiation counters
electron microscopy
light scattering
electron diffraction
low pressure
vapor phases

Cite this

Detection of aluminum particles during the chemical vapor deposition of aluminum films using tertiaryamine complexes of alane (AIH 3 ) . / Simmonds, Michael G.; Gladfelter, Wayne L; Rao, Nagaraja; Szymanski, Wladyslaw W.; Ahn, Kang Ho; McMurry, Peter H.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 9, No. 5, 01.01.1991, p. 2782-2784.

Research output: Contribution to journalLetter

@article{dae03b6d93334cb7b9e7408efbb01943,
title = "Detection of aluminum particles during the chemical vapor deposition of aluminum films using tertiaryamine complexes of alane (AIH 3 )",
abstract = "Two methods of analyzing particles were interfaced to a low pressure chemical vapor deposition (CVD) reactor to evaluate whether or not particles were formed in the gas phase during the growth of aluminum films using tertiaryamine complexes of alane. A laser light scattering particle counter was used to detect large (> 200 nm) particles in real time and established that the appearance of particles corresponded to the flow of precursor into the CVD reactor. A particle impaction system was used to collect particles (> 20 nm) for analysis using analytical electron microscopy and electron diffraction. This established that the particles were crystalline aluminum and that the particle sizes ranged from 20–700 nm. The median size was 85 nm.",
author = "Simmonds, {Michael G.} and Gladfelter, {Wayne L} and Nagaraja Rao and Szymanski, {Wladyslaw W.} and Ahn, {Kang Ho} and McMurry, {Peter H}",
year = "1991",
month = "1",
day = "1",
doi = "10.1116/1.577534",
language = "English (US)",
volume = "9",
pages = "2782--2784",
journal = "Journal of Vacuum Science and Technology A",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "5",

}

TY - JOUR

T1 - Detection of aluminum particles during the chemical vapor deposition of aluminum films using tertiaryamine complexes of alane (AIH 3 )

AU - Simmonds, Michael G.

AU - Gladfelter, Wayne L

AU - Rao, Nagaraja

AU - Szymanski, Wladyslaw W.

AU - Ahn, Kang Ho

AU - McMurry, Peter H

PY - 1991/1/1

Y1 - 1991/1/1

N2 - Two methods of analyzing particles were interfaced to a low pressure chemical vapor deposition (CVD) reactor to evaluate whether or not particles were formed in the gas phase during the growth of aluminum films using tertiaryamine complexes of alane. A laser light scattering particle counter was used to detect large (> 200 nm) particles in real time and established that the appearance of particles corresponded to the flow of precursor into the CVD reactor. A particle impaction system was used to collect particles (> 20 nm) for analysis using analytical electron microscopy and electron diffraction. This established that the particles were crystalline aluminum and that the particle sizes ranged from 20–700 nm. The median size was 85 nm.

AB - Two methods of analyzing particles were interfaced to a low pressure chemical vapor deposition (CVD) reactor to evaluate whether or not particles were formed in the gas phase during the growth of aluminum films using tertiaryamine complexes of alane. A laser light scattering particle counter was used to detect large (> 200 nm) particles in real time and established that the appearance of particles corresponded to the flow of precursor into the CVD reactor. A particle impaction system was used to collect particles (> 20 nm) for analysis using analytical electron microscopy and electron diffraction. This established that the particles were crystalline aluminum and that the particle sizes ranged from 20–700 nm. The median size was 85 nm.

UR - http://www.scopus.com/inward/record.url?scp=84953680788&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84953680788&partnerID=8YFLogxK

U2 - 10.1116/1.577534

DO - 10.1116/1.577534

M3 - Letter

VL - 9

SP - 2782

EP - 2784

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

SN - 0734-2101

IS - 5

ER -