Design and performance of a molecular beam epitaxy system for metallic heterostructure deposition illustrated by a study of the controlled epitaxy of Cu(111)/Al2O3(0001)

M. S. Lund, C. Leighton

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The design and construction of a molecular beam epitaxy (MBE) system for metallic heterostructure deposition was analyzed. The system was compact, cost effective and incorporated only the essential components for the deposition of magnetic metals. It was also observed that the system had a large source to substrate distance, with axial deposition for compatibility with nanolithographic masks. The results show that the inplane crystallite size could be varied independently of the surface roughness by varying the deposition rate at room temperature.

Original languageEnglish (US)
Pages (from-to)2027-2034
Number of pages8
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume22
Issue number5
DOIs
StatePublished - Sep 1 2004

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Epitaxial growth
Molecular beam epitaxy
epitaxy
Heterojunctions
molecular beam epitaxy
Crystallite size
Deposition rates
magnetic metals
Masks
Surface roughness
Metals
compatibility
surface roughness
masks
Substrates
costs
Costs
room temperature
Temperature

Cite this

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