Abstract
We report a unique scanning microellipsometer using a high numerical aperture lens to provide large-angle ellipsometric illumination and high spatial resolution. This microellipsometer is equivalent to a multi-channel rotating analyzer ellipsometer obeying rotational symmetry. The symmetry is realized by using a circularly polarized incident beam, a variable circular retarder and a rotational analyzer. This rotational symmetry offers better signal-to-noise ratio compared with the other microellipsometer techniques. Scanning ellipsometric measurement of surface relief with spatial resolution of 0.5 μm is performed with a NA of 0.8 illumination by use of a He-Ne laser source.
Original language | English (US) |
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Pages (from-to) | 83-89 |
Number of pages | 7 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 4779 |
DOIs | |
State | Published - 2002 |
Event | Advanced Characterization Techniques for Optical, Semiconductor, and data Storage Components - Seattle, WA, United States Duration: Jul 9 2002 → Jul 11 2002 |