We report a unique scanning microellipsometer using a high numerical aperture lens to provide large-angle ellipsometric illumination and high spatial resolution. This microellipsometer is equivalent to a multi-channel rotating analyzer ellipsometer obeying rotational symmetry. The symmetry is realized by using a circularly polarized incident beam, a variable circular retarder and a rotational analyzer. This rotational symmetry offers better signal-to-noise ratio compared with the other microellipsometer techniques. Scanning ellipsometric measurement of surface relief with spatial resolution of 0.5 μm is performed with a NA of 0.8 illumination by use of a He-Ne laser source.
|Original language||English (US)|
|Number of pages||7|
|Journal||Proceedings of SPIE - The International Society for Optical Engineering|
|State||Published - Dec 1 2002|
|Event||Advanced Characterization Techniques for Optical, Semiconductor, and data Storage Components - Seattle, WA, United States|
Duration: Jul 9 2002 → Jul 11 2002