Deposition of epitaxial α-Fe2O3 layers for exchange bias studies by reactive dc magnetron sputtering

C. Leighton; A. Hoffmann; M. R. Fitzsimmons; J. Nogués; Ivan K. Schuller

doi:10.1080/13642810110061501

Deposition of epitaxial α-Fe₂O₃ layers for exchange bias studies by reactive dc magnetron sputtering

C. Leighton, A. Hoffmann, M. R. Fitzsimmons, J. Nogués, Ivan K. Schuller

Chemical Engineering and Materials Science

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

We describe the deposition and characterization of epitaxial thin films of the iron oxide haematite (α-Fe₂O₃), a promising candidate for fundamental studies of exchange anisotropy as well as for high thermal stability applications. The films were deposited by reactive dc magnetron sputtering. Structural characterization was by large-angle X-ray diffraction and grazing-incidence reflectivity (with the scattering vector normal to the sample plane), in-plane grazing-incidence diffraction (scattering vector in the sample plane) and reflection high-energy electron diffraction. Optimized sputtering conditions result in good epitaxy both in the growth direction and in the plane, as well as very smooth surfaces.

Original language	English (US)
Pages (from-to)	1927-1934
Number of pages	8
Journal	Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties
Volume	81
Issue number	12
DOIs	https://doi.org/10.1080/13642810110061501
State	Published - Dec 2001

Bibliographical note

Funding Information:
ACKNOWLEDGEMENTS We would like to thank S. Kim for assistance with RHEED measurements and for illuminating discussions. This work was supported by the US Department of Energy, BES-DMS, under contract W-7405-Eng-36.

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10.1080/13642810110061501

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Leighton, C., Hoffmann, A., Fitzsimmons, M. R., Nogués, J., & Schuller, I. K. (2001). Deposition of epitaxial α-Fe₂O₃ layers for exchange bias studies by reactive dc magnetron sputtering. Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, 81(12), 1927-1934. https://doi.org/10.1080/13642810110061501

Deposition of epitaxial α-Fe₂O₃ layers for exchange bias studies by reactive dc magnetron sputtering. / Leighton, C.; Hoffmann, A.; Fitzsimmons, M. R. et al.
In: Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, Vol. 81, No. 12, 12.2001, p. 1927-1934.

Research output: Contribution to journal › Article › peer-review

Leighton, C, Hoffmann, A, Fitzsimmons, MR, Nogués, J & Schuller, IK 2001, 'Deposition of epitaxial α-Fe₂O₃ layers for exchange bias studies by reactive dc magnetron sputtering', Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, vol. 81, no. 12, pp. 1927-1934. https://doi.org/10.1080/13642810110061501

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abstract = "We describe the deposition and characterization of epitaxial thin films of the iron oxide haematite (α-Fe2O3), a promising candidate for fundamental studies of exchange anisotropy as well as for high thermal stability applications. The films were deposited by reactive dc magnetron sputtering. Structural characterization was by large-angle X-ray diffraction and grazing-incidence reflectivity (with the scattering vector normal to the sample plane), in-plane grazing-incidence diffraction (scattering vector in the sample plane) and reflection high-energy electron diffraction. Optimized sputtering conditions result in good epitaxy both in the growth direction and in the plane, as well as very smooth surfaces.",

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