Deposition dependence of zirconium tungstate (ZrW2O8) based negative thermal expansion films for optical coatings

Michael S. Sutton; Joseph J. Talghader

Deposition dependence of zirconium tungstate (ZrW₂O₈) based negative thermal expansion films for optical coatings

Electrical and Computer Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Zirconium tungstate-based thin films have been deposited with positive and negative thermal expansion coefficients, where the type of exp ansion appears to be critically dependent on the film density. Film deposition and characterization is presented.

Original language	English (US)
Title of host publication	Optical Interference Coatings, OIC 2004
Publisher	Optica Publishing Group (formerly OSA)
ISBN (Electronic)	3540003649
State	Published - 2004
Event	Optical Interference Coatings, OIC 2004 - Tucson, United States Duration: Jun 27 2004 → Jul 2 2004

Publication series

Name	Optics InfoBase Conference Papers

Conference

Conference	Optical Interference Coatings, OIC 2004
Country/Territory	United States
City	Tucson
Period	6/27/04 → 7/2/04

Bibliographical note

Publisher Copyright:
© 2004 OSA - The Optical Society. All rights reserved.

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Deposition dependence of zirconium tungstate (ZrW₂O₈) based negative thermal expansion films for optical coatings. / Sutton, Michael S.; Talghader, Joseph J.

Optical Interference Coatings, OIC 2004. Optica Publishing Group (formerly OSA), 2004. (Optics InfoBase Conference Papers).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

@inproceedings{dd2a13075bc44afcb3446c0278afda64,

title = "Deposition dependence of zirconium tungstate (ZrW2O8) based negative thermal expansion films for optical coatings",

abstract = "Zirconium tungstate-based thin films have been deposited with positive and negative thermal expansion coefficients, where the type of exp ansion appears to be critically dependent on the film density. Film deposition and characterization is presented.",

author = "Sutton, {Michael S.} and Talghader, {Joseph J.}",

year = "2004",

language = "English (US)",

series = "Optics InfoBase Conference Papers",

publisher = "Optica Publishing Group (formerly OSA)",

booktitle = "Optical Interference Coatings, OIC 2004",

}

TY - GEN

T1 - Deposition dependence of zirconium tungstate (ZrW2O8) based negative thermal expansion films for optical coatings

AU - Sutton, Michael S.

AU - Talghader, Joseph J.

PY - 2004

Y1 - 2004

N2 - Zirconium tungstate-based thin films have been deposited with positive and negative thermal expansion coefficients, where the type of exp ansion appears to be critically dependent on the film density. Film deposition and characterization is presented.

AB - Zirconium tungstate-based thin films have been deposited with positive and negative thermal expansion coefficients, where the type of exp ansion appears to be critically dependent on the film density. Film deposition and characterization is presented.

UR - http://www.scopus.com/inward/record.url?scp=85135900808&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85135900808&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:85135900808

T3 - Optics InfoBase Conference Papers

BT - Optical Interference Coatings, OIC 2004

PB - Optica Publishing Group (formerly OSA)

T2 - Optical Interference Coatings, OIC 2004

Y2 - 27 June 2004 through 2 July 2004

ER -