Deposition dependence of zirconium tungstate (ZrW2O8) based negative thermal expansion films for optical coatings

Michael S. Sutton, Joseph J. Talghader

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Zirconium tungstate-based thin films have been deposited with positive and negative thermal expansion coefficients, where the type of exp ansion appears to be critically dependent on the film density. Film deposition and characterization is presented.

Original languageEnglish (US)
Title of host publicationOptical Interference Coatings, OIC 2004
PublisherOptica Publishing Group (formerly OSA)
ISBN (Electronic)3540003649
StatePublished - 2004
EventOptical Interference Coatings, OIC 2004 - Tucson, United States
Duration: Jun 27 2004Jul 2 2004

Publication series

NameOptics InfoBase Conference Papers

Conference

ConferenceOptical Interference Coatings, OIC 2004
Country/TerritoryUnited States
CityTucson
Period6/27/047/2/04

Bibliographical note

Publisher Copyright:
© 2004 OSA - The Optical Society. All rights reserved.

Fingerprint

Dive into the research topics of 'Deposition dependence of zirconium tungstate (ZrW2O8) based negative thermal expansion films for optical coatings'. Together they form a unique fingerprint.

Cite this