Dependence of ordering kinetics of FePt thin films on different substrates

C. L. Zha, S. H. He, B. Ma, Z. Z. Zhang, F. X. Gan, Q. Y. Jin

Research output: Contribution to journalArticlepeer-review

9 Scopus citations


FePt thin films are deposited on SrTiO3, MgO, and a 2 nm-FeOx underlayer on an Si substrate at room temperature and then annealed at elevated temperatures. Studies of the L10 ordering process in each case show that the ordering temperature for the FePt film on the nonepitaxial Si/FeOx substrate is ∼150 °C lower than the epitaxial FePt films deposited on MgO and SrTiO3 substrates. We argue that internal stresses arising from lattice defects and a recrystallizing process as well as thermal strain from differences in thermal expansion between substrate and film are responsible for the differences in ordering kinetics from the A1 to L10 phase of FePt on the various substrates.

Original languageEnglish (US)
Pages (from-to)3539-3542
Number of pages4
JournalIEEE Transactions on Magnetics
Issue number11 PART 2
StatePublished - Nov 1 2008


  • Epitaxial growth
  • FePt
  • Nonepitaxial growth
  • Ordering kinetics

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