Controlling film growth with selective excitation: Chemical vapor deposition growth of silicon

Biao Wu; Philip I. Cohen; L. C. Feldman; Zhenyu Zhang

doi:10.1063/1.1687452

Controlling film growth with selective excitation: Chemical vapor deposition growth of silicon

Biao Wu, Philip I. Cohen, L. C. Feldman, Zhenyu Zhang

Electrical and Computer Engineering

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

A thin film growth control method called selectively enhanced adatom diffusion (SEAD) was proposed, which is used to promote the step-flow growth. The geometric frequency difference at a surface was used in an infrared laser to selectively excite only blocking adatoms at steps. It was stated that key to the method is to selectively excite blocking adatoms and enhance their mobility by properly tuning the laser frequency. The methods feasability for the chemical vapor desposition (CVD) growth of silicon was also discussed.

Original language	English (US)
Pages (from-to)	2175-2177
Number of pages	3
Journal	Applied Physics Letters
Volume	84
Issue number	12
DOIs	https://doi.org/10.1063/1.1687452
State	Published - Mar 22 2004

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@article{75df389252194584965504aae11da6a3,

title = "Controlling film growth with selective excitation: Chemical vapor deposition growth of silicon",

abstract = "A thin film growth control method called selectively enhanced adatom diffusion (SEAD) was proposed, which is used to promote the step-flow growth. The geometric frequency difference at a surface was used in an infrared laser to selectively excite only blocking adatoms at steps. It was stated that key to the method is to selectively excite blocking adatoms and enhance their mobility by properly tuning the laser frequency. The methods feasability for the chemical vapor desposition (CVD) growth of silicon was also discussed.",

author = "Biao Wu and Cohen, {Philip I.} and Feldman, {L. C.} and Zhenyu Zhang",

year = "2004",

month = mar,

day = "22",

doi = "10.1063/1.1687452",

language = "English (US)",

volume = "84",

pages = "2175--2177",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "12",

}

TY - JOUR

T1 - Controlling film growth with selective excitation

T2 - Chemical vapor deposition growth of silicon

AU - Wu, Biao

AU - Cohen, Philip I.

AU - Feldman, L. C.

AU - Zhang, Zhenyu

PY - 2004/3/22

Y1 - 2004/3/22

N2 - A thin film growth control method called selectively enhanced adatom diffusion (SEAD) was proposed, which is used to promote the step-flow growth. The geometric frequency difference at a surface was used in an infrared laser to selectively excite only blocking adatoms at steps. It was stated that key to the method is to selectively excite blocking adatoms and enhance their mobility by properly tuning the laser frequency. The methods feasability for the chemical vapor desposition (CVD) growth of silicon was also discussed.

AB - A thin film growth control method called selectively enhanced adatom diffusion (SEAD) was proposed, which is used to promote the step-flow growth. The geometric frequency difference at a surface was used in an infrared laser to selectively excite only blocking adatoms at steps. It was stated that key to the method is to selectively excite blocking adatoms and enhance their mobility by properly tuning the laser frequency. The methods feasability for the chemical vapor desposition (CVD) growth of silicon was also discussed.

UR - http://www.scopus.com/inward/record.url?scp=1942444568&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=1942444568&partnerID=8YFLogxK

U2 - 10.1063/1.1687452

DO - 10.1063/1.1687452

M3 - Article

AN - SCOPUS:1942444568

SN - 0003-6951

VL - 84

SP - 2175

EP - 2177

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 12

ER -

Controlling film growth with selective excitation: Chemical vapor deposition growth of silicon

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