Control of thermal deformation in dielectric mirrors using mechanical design and atomic layer deposition

Nicholas T. Gabriel, Sangho S. Kim, Joseph J Talghader

Research output: Contribution to journalArticlepeer-review

17 Scopus citations

Abstract

A mechanical design technique for optical coatings that simultaneously controls thermal deformation and optical reflectivity is reported. The method requires measurement of the refractive index and thermal stress of single Alms prior to the design. Atomic layer deposition was used for deposition because of the high repeatability of the film constants. An Al2O 3/HfO2 distributed Bragg reflector was deposited with a predicted peak reflectivity of 87.9% at 542.4 nm and predicted edge deformation of -360 nm/K on a 10 cm silicon substrate. The measured peak reflectivity was 85.7% at 541.7 nm with an edge deformation of -346 nm/K.

Original languageEnglish (US)
Pages (from-to)1958-1960
Number of pages3
JournalOptics Letters
Volume34
Issue number13
DOIs
StatePublished - Jul 1 2009

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