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Continuous c-oriented AlPO
4
-5 films by tertiary growth
Georgios N. Karanikolos
, James W. Wydra
, Jared A. Stoeger
, Hermenegildo García
, Avelino Corma
, Michael Tsapatsis
Chemical Engineering and Materials Science
Research output
:
Contribution to journal
›
Article
›
peer-review
56
Scopus citations
Overview
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4
-5 films by tertiary growth'. Together they form a unique fingerprint.
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Keyphrases
AlPO4-5
100%
Highly Oriented
66%
Seeded Growth
33%
Secondary Treatment
33%
Silicon Substrate
33%
Electronic Applications
33%
Columnar Grain
33%
Hydrothermal Treatment
33%
Oriented Films
33%
Columnar Crystal
33%
In-plane Growth
33%
Electrochemical Applications
33%
Engineering
Silicon Substrate
100%
Hydrothermal Synthesis
100%
Columnar Grain
100%
Secondary Treatment
100%
Material Science
Film
100%
Catalysis
25%
Silicon
25%
Hydrothermal Synthesis
25%