Abstract
The design of active array structures in analog circuits requires careful matching to minimize the impact of variations. This work presents a constructive approach for building these arrays to directly incorporate shifts due to process variations, considering systematic first-order and second order gradients; to account for systematic layout effects, including parasitic mismatch and layout-dependent effects due to stress; and to ensure that the resulting layout delivers high performance. The proposed algorithms are targeted to FinFET technologies and are validated for multiple analog blocks in a commercial 12-nm FinFET process. The layouts generated by the proposed method are demonstrated to provide better matching and performance than prior methods.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 4373-4385 |
| Number of pages | 13 |
| Journal | IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems |
| Volume | 43 |
| Issue number | 12 |
| DOIs | |
| State | Published - 2024 |
Bibliographical note
Publisher Copyright:© 2024 IEEE.
Keywords
- Electromigration (EM)
- layout-dependent effects (LDEs)
- mismatch
- nonlinear gradients
- routing parasitic
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