Computer graphic reflection modeling techniques were used to study the surface reflection of paper. Models of the subsurface microstructure of paper were constructed and the reflection of light from these models was simulated using Monte Carlo methods. Measurements of the spatial distribution of light reflected from several paper samples were also taken. Factors studied that affect reflection from paper include formation, fiber orientation, and coating. Good agreement was found between the simulations and both the analytical and measured reflectances for the paper samples.
|Original language||English (US)|
|Number of pages||12|
|State||Published - Dec 1 1998|
|Event||Final Program and Proceedings: IS and T's 51st Annual Conference - Portland, OR, United States|
Duration: May 17 1998 → May 20 1998
|Other||Final Program and Proceedings: IS and T's 51st Annual Conference|
|Period||5/17/98 → 5/20/98|