Comparison of material removal rate models and experimental results for the double-sided polishing process

Barney E. Klamecki

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

In the double-sided polishing process both faces of the workpiece are polished simultaneously under apparently identical conditions. However, differences are observed in the material removal rate between the two workpiece faces, and over a series of polishing runs, the side from which more material is removed changes. Polishing process models describing material removal rate were developed and compared to observed behavior. The side-to-side difference in stock removal and change in workpiece side of greater material removal rate can be attributed to slurry flow redistribution due to accumulation of polishing debris in the polishing pads.

Original languageEnglish (US)
Pages (from-to)248-253
Number of pages6
JournalJournal of Materials Processing Technology
Volume109
Issue number3
DOIs
StatePublished - Feb 15 2001

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